es
en
MAKING SUCCESS STORIES HAPPEN
 

  • Lead the development, characterization, and optimization of advanced Dry Etch processes for cutting-edge memory structures.

  • Collaborate cross-functionally with integration, metrology, equipment, and R&D teams to ensure process robustness and manufacturability.

  • Define and execute technical roadmaps aligned with advanced memory scaling requirements and yield improvement goals.

  • Evaluate and implement next-generation etch technologies, novel chemistries, and advanced hardware platforms.

  • Mentor and guide junior engineers, fostering a culture of innovation and technical excellence.

  • Interface with strategic equipment vendors and global partners to co-develop innovative solutions.

  • Drive root cause analysis and continuous improvement initiatives for complex, process-related yield limiters.

  • Present technical findings, strategic roadmaps, and project recommendations to executive leadership and global teams.

Qualifications:

  • Ph.D. or Master’s degree in Electrical Engineering, Materials Science, Chemical Engineering, Physics, or a related discipline.

  • Hands-on experience in Dry Etch process development, with a strong preference for background in DRAM or advanced memory technologies.

  • Proven track record of technical leadership and project ownership in semiconductor process engineering.

  • Deep understanding of plasma etch mechanisms, advanced process control, and defect mitigation strategies.

  • Extensive experience with industry-standard advanced etch tools (e.g., Lam Research, TEL, AMAT) and complex characterization techniques.

  • Strong analytical, problem-solving, and cross-cultural communication skills.

  • Demonstrated ability to lead cross-functional teams and manage complex, multi-site projects.

Preferred Skills:

  • Specialized experience with high aspect ratio etching, critical dimension (CD) control, and selectivity challenges in advanced memory nodes.

  • Familiarity with advanced data analytics, Design of Experiments (DOE) methodologies, and Statistical Process Control (SPC) tools.

  • Comprehensive knowledge of integration challenges in sub-20nm memory technology nodes.

Inscribirme en esta oferta: Dry Etch Process, Engineer to Manager
Referencia: GC879021

Por favor, completa todos los campos marcados *

*

*

*

*

*

MS Word, PDF, HTML y formatos de texto

¿Tienes problemas al inscribirte con linkedin? Pincha aquí

*
Los datos facilitados al enviar este formulario se tratarán de conformidad con nuestro Aviso de privacidad.
Acepto el Aviso de privacidad de Morgan Philips

Dry Etch Process, Engineer to Manager
Taichung, Central Taiwan, Taiwan | Indefinido