Dry Etch Process, Engineer to Manager
Publiée depuis : 02/09/2026
Taichung Central Taiwan Taïwan
CDI
Semiconductor
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Lead the development, characterization, and optimization of advanced Dry Etch processes for cutting-edge memory structures.
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Collaborate cross-functionally with integration, metrology, equipment, and R&D teams to ensure process robustness and manufacturability.
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Define and execute technical roadmaps aligned with advanced memory scaling requirements and yield improvement goals.
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Evaluate and implement next-generation etch technologies, novel chemistries, and advanced hardware platforms.
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Mentor and guide junior engineers, fostering a culture of innovation and technical excellence.
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Interface with strategic equipment vendors and global partners to co-develop innovative solutions.
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Drive root cause analysis and continuous improvement initiatives for complex, process-related yield limiters.
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Present technical findings, strategic roadmaps, and project recommendations to executive leadership and global teams.
Qualifications:
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Ph.D. or Master’s degree in Electrical Engineering, Materials Science, Chemical Engineering, Physics, or a related discipline.
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Hands-on experience in Dry Etch process development, with a strong preference for background in DRAM or advanced memory technologies.
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Proven track record of technical leadership and project ownership in semiconductor process engineering.
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Deep understanding of plasma etch mechanisms, advanced process control, and defect mitigation strategies.
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Extensive experience with industry-standard advanced etch tools (e.g., Lam Research, TEL, AMAT) and complex characterization techniques.
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Strong analytical, problem-solving, and cross-cultural communication skills.
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Demonstrated ability to lead cross-functional teams and manage complex, multi-site projects.
Preferred Skills:
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Specialized experience with high aspect ratio etching, critical dimension (CD) control, and selectivity challenges in advanced memory nodes.
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Familiarity with advanced data analytics, Design of Experiments (DOE) methodologies, and Statistical Process Control (SPC) tools.
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Comprehensive knowledge of integration challenges in sub-20nm memory technology nodes.